Thin film deposition of Au on the TiO2 substrate by physical vapor deposition (PVD) technique

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dc.contributor.authorIqfath, Mohammad Musfeq
dc.contributor.authorMahmud, Sakib
dc.contributor.authorNishat, Maksuraton
dc.contributor.authorChowdhury, Fariya
dc.contributor.authorHaque, Md. Ehasanul
dc.date.accessioned2025-05-19T04:43:38Z
dc.date.available2025-05-19T04:43:38Z
dc.date.issued2022-01-24
dc.identifier.otherhttp://dspace.aiub.edu:8080/xmlui/handle/123456789/2719
dc.identifier.urihttp://dspace.aiub.edu:8080/jspui/handle/123456789/2719
dc.language.isoen
dc.sourceAIUB Institutional Repository
dc.titleThin film deposition of Au on the TiO2 substrate by physical vapor deposition (PVD) technique
dc.typeArticle

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